发明名称 SUBSTRATE PROCESSING APPARATUS
摘要 A substrate processing apparatus is provided to improve process efficiency about a bonding apparatus by simultaneously bonding a plurality of substrates. A substrate processing apparatus comprises a chamber(302) and a plurality of jigs(301,310,320,330a,330b,330c,330d,340a,340b,340c,340d). The jigs are parallel provided to the inside of the chamber. One of the first and second substrates are absorbed to one side of one of the adjacent jigs. One of the first and second substrates is absorbed to the other side.
申请公布号 KR20090093549(A) 申请公布日期 2009.09.02
申请号 KR20080019121 申请日期 2008.02.29
申请人 ADP ENGINEERING CO., LTD. 发明人 HA, SU CHUL;PARK, WOO JONG
分类号 G02F1/13 主分类号 G02F1/13
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