发明名称 |
Apparatus for defining regions of process exclusion and process performance in a process chamber |
摘要 |
Positional relationships are established in a process chamber. An upper electrode is configured with a first surface to support a wafer, and an electrode has a second surface. A linear drive is mounted on the base and a linkage connected between the drive and the upper electrode. Linkage adjustment defines a desired orientation between the surfaces. The linear drive and linkage maintain the desired orientation while the assembly moves the upper electrode with the surfaces moving relative to each other. An annular etching region defined between the electrodes enables etching of a wafer edge exclusion region extending along a top and bottom of the wafer. Removable etch defining rings are configured to define unique lengths along each of the top and bottom of the wafer to be etched. Positional relationships of the surfaces enable limiting the etching to those unique lengths of the exclusion region.
|
申请公布号 |
US7575638(B2) |
申请公布日期 |
2009.08.18 |
申请号 |
US20070701854 |
申请日期 |
2007.02.02 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
BAILEY, III ANDREW D.;CHEN JACK;KIM YUNSANG;SEXTON GREGORY S. |
分类号 |
B05B5/025;C23C16/00;C23F1/00;H01L21/306 |
主分类号 |
B05B5/025 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|