发明名称 Quantum dot laser diode and method of manufacturing the same
摘要 Provided are a quantum dot laser diode and a method of manufacturing the same. The method of manufacturing a quantum dot laser diode includes the steps of: forming a grating structure layer including a plurality of gratings on a substrate; forming a first lattice-matched layer on the grating structure layer; forming at least one quantum dot layer having at least one quantum dot on the first lattice-matched layer; forming a second lattice-matched layer on the quantum dot layer; forming a cladding layer on the second lattice-matched layer; and forming an ohmic contact layer on the cladding layer. Consequently, it is possible to obtain high gain at a desired wavelength without affecting the uniformity of quantum dots, so that the characteristics of a laser diode can be improved.
申请公布号 US7575943(B2) 申请公布日期 2009.08.18
申请号 US20060607516 申请日期 2006.12.01
申请人 ELECTRONICS AND TELECOMMUNICATIONS RESEARCH INSTITUTE 发明人 KIM JIN SOO;LEE JIN HONG;HONG SUNG UI;KWACK HO SANG;CHOI BYUNG SEOK;OH DAE KON
分类号 H01L21/00 主分类号 H01L21/00
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