发明名称 Manufacturing method of semiconductor device having organic semiconductor film
摘要 A method of manufacturing a semiconductor device having an organic semiconductor film comprises a step of preparing a transparent substrate at least having an opaque gate electrode and a gate insulator thereover, a step of forming a layer containing metal-nano-particles as a conductive layer for a source electrode and a drain electrode to the thus prepared transparent substrate, a step of applying exposure to the transparent substrate on the side of a surface not mounted with the opaque gate electrode, a step of flushing away a portion other than the source electrode and the drain electrode in the layer containing the metal-nano-particles after the exposure, and a step of forming an organic semiconductor layer forming a channel portion. Lower and upper electrodes are positioned in self-alignment manner and thus no positional displacement occurs even if a printing method is used. Accordingly, semiconductor devices such as flexible substrates using an organic semiconductor can be manufactured inexpensively by using a printing method.
申请公布号 US7575952(B2) 申请公布日期 2009.08.18
申请号 US20070797419 申请日期 2007.05.03
申请人 HITACHI, LTD. 发明人 ARAI TADASHI;SAITO SHINICHI
分类号 H01L51/40 主分类号 H01L51/40
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