发明名称 Alignment apparatus and alignment method
摘要 An alignment apparatus, which is used when positioning and joining a plurality of workpieces relative to each other, each workpiece having a plurality of alignment marks for alignment, the alignment apparatus includes: a transparent mask provided with reference marks with which the alignment marks are aligned; a mirror disposed between the mask and the workpiece; an optical unit having an optical axis pointed in a direction of the mirror via the reference mark from a side of the mask opposite to the mirror, the optical unit enabling the reference mark and a virtual image of the reference mark reflected in the mirror to be observed simultaneously; and an adjusting unit for making optical axis adjustment of the optical axis, based on the observation by the optical unit, such that a real image of the reference mark and the virtual image of the reference mark reflected in the mirror are superposed.
申请公布号 US7576859(B2) 申请公布日期 2009.08.18
申请号 US20070854075 申请日期 2007.09.12
申请人 SEIKO EPSON CORPORATION 发明人 OKAMURO TAKUMA;OKUMURA MOTONORI;OTA MUTSUHIKO;GOTO KAZUTOSHI;YANAGISAWA ISAO;INAOKA YASUO
分类号 G01B11/00;B41J29/393 主分类号 G01B11/00
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