发明名称 Measurement apparatus, exposure apparatus, and device fabrication method
摘要 A measurement apparatus which measures a wavefront aberration of an optical system to be measured, the apparatus comprises a detection unit configured to detect an interference pattern formed by light having passed through a mask inserted on an object plane of the optical system to be measured, and a mask inserted on an image plane of the optical system to be measured.
申请公布号 US7576870(B2) 申请公布日期 2009.08.18
申请号 US20080971569 申请日期 2008.01.09
申请人 CANON KABUSHIKI KAISHA 发明人 FURUKAWA YASUNORI
分类号 G01B11/02;G01B9/02 主分类号 G01B11/02
代理机构 代理人
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