发明名称 Photosensitive Ink Composition for Screen Printing and Method of Forming Positive Relief Pattern with Use Thereof
摘要 Disclosed is a photosensitive ink which can form a coated film that is excellent in insulation properties, heat resistance, low warping, low elasticity and adhesion with the substrate, when used as an ink for screen printing, and with which clogging of the screen, bleeding, blur, chipping and the like are unlikely to occur even when the screen printing is repeatedly carried out, so that which has an excellent ease of handling in printing. The ink composition comprises 100 parts by weight of an organic solvent-soluble polyimide block copolymer(s), and 1 to 100 parts by weight of a photoacid generator(s). The polyimide block copolymer(s) and the photoacid generator(s) are dissolved in an organic solvent. The polyimide block copolymer(s) contain(s) in its molecular skeleton a diamine having a siloxane bond, and an aromatic diamine having a hydroxyl group(s) and/or carboxyl group(s) at ortho-position with respect to an amino group.
申请公布号 US2009186295(A1) 申请公布日期 2009.07.23
申请号 US20070224593 申请日期 2007.03.02
申请人 WIN MAW SOE;GOSHIMA TOSHIYUKI;SEGAWA SIGEMASA;NAKAJIMA SHINTARO;KYO EIKA;NISHIKAWA YOSHIKAZU;WAKI SHUZO 发明人 WIN MAW SOE;GOSHIMA TOSHIYUKI;SEGAWA SIGEMASA;NAKAJIMA SHINTARO;KYO EIKA;NISHIKAWA YOSHIKAZU;WAKI SHUZO
分类号 G03F7/004;G03F7/20 主分类号 G03F7/004
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