AROMATIC FLUORINE-FREE PHOTOACID GENERATORS AND PHOTORESIST COMPOSITIONS CONTAINING THE SAME
摘要
<p>Fluorine-free photoacid generators and photoresist compositions containing fluorine-free photoacid generators are enabled as alternatives to PFOS/PFAS photoacid generator-containing photoresists. The photoacid generators are characterized by the presence of a fluorine-free aromatic sulfonate anionic component having one or more electron withdrawing groups. The photoacid generators preferably contain a fluorine-free onium cationic component, more preferably a sulfonium cationic component. The photoresist compositions preferably contain an acid sensitive imaging polymer having a lactone functionality. The compositions are especially useful for forming material patterns using 193nm (ArF) imaging radiation.</p>
申请公布号
WO2009091704(A2)
申请公布日期
2009.07.23
申请号
WO2009US30792
申请日期
2009.01.13
申请人
INTERNATIONAL BUSINESS MACHINES CORPORATION;LI, WENJIE;HUANG, WU-SONG, S.;VARANASI, PUSHKARA, R.;LIU, SEN;POPOVA, IRENE, Y.
发明人
LI, WENJIE;HUANG, WU-SONG, S.;VARANASI, PUSHKARA, R.;LIU, SEN;POPOVA, IRENE, Y.