| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a positive resist composition which does not require prebake in a process of forming a resist film and has high sensitivity and proper pattern-forming properties. <P>SOLUTION: The positive resist composition comprises (A) 100 pts.mass of a vinyl polymer, having a structural unit represented by formula (I) (wherein R<SP>1</SP>represents a hydrogen atom or a lower alkyl group, and R<SP>2</SP>represents a substituted or unsubstituted alkyl group, a substituted or unsubstituted aryl group or a substituted or unsubstituted aralkyl group) and having a glass transition temperature of 20-100°C, and (B) 1.0-30 pts.mass of a photoacid generator represented by a specific structure. <P>COPYRIGHT: (C)2009,JPO&INPIT |
