发明名称 LINE HEAD AND IMAGE FORMING APPARATUS
摘要 <p><P>PROBLEM TO BE SOLVED: To provide a technique which enables realizing good exposure by suppressing adhesion of foreign substances to a lens array with a plurality of lenses disposed in two dimensions. <P>SOLUTION: The line head is equipped with both the lens array in which a plurality of lens rows each with a plurality of lenses arranged in a first direction for ejecting the light incident from a plane of incidence out of an ejection plane are disposed in a second direction orthogonal or nearly orthogonal to the first direction, and a head substrate in which a light emitting element group of a grouped plurality of light emitting elements is set correspondingly for each lens. In the head substrate, the light emitting element group is set oppositely to the plane of incidence of the corresponding lens, and ejects the light towards the plane of incidence of the lens. The plane of incidence of the lens is a convex surface, and the ejection plane of the lens is a flat surface. <P>COPYRIGHT: (C)2009,JPO&INPIT</p>
申请公布号 JP2009160740(A) 申请公布日期 2009.07.23
申请号 JP20070339247 申请日期 2007.12.28
申请人 SEIKO EPSON CORP 发明人 SOWA KEN;INOUE NOZOMI;NOMURA YUJIRO
分类号 B41J2/44;B41J2/45;B41J2/455;G02B3/00;H01L33/00 主分类号 B41J2/44
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