| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a mask blanking substrate capable of reducing fine surface defects on a substrate surface, and having high smoothness and reduced variation in surface roughness among substrates and within a substrate plane, a reflective mask blank with high reflectance and reduced variation in reflectance among the substrates and within the substrate plane, and a reflective mask free from transfer pattern defects caused by the fine surface defects and the variation in the reflectance among the substrates and within the substrate plane. <P>SOLUTION: A manufacturing method of the mask blanking substrate 1 includes a polishing step of supplying a polishing liquid containing polishing abrasive grains onto a surface of a glass substrate and polishing the surface of the glass substrate by relatively moving the glass substrate and a polishing pad, wherein the polishing abrasive grain is colloidal silica having an absolute value of zeta-potential of 10 mV or higher to keep pH of the polishing liquid during polishing in a range of 1-5. A multilayer reflective film 2 and an absorber film 4 are formed on the mask blanking substrate 1 to make the reflective mask blank 10, and the absorber film 4 in the reflective mask blank 10 is patterned to form an absorber pattern to make the reflective mask 20. <P>COPYRIGHT: (C)2009,JPO&INPIT |
