| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate treatment apparatus capable of treating a substrate, in a state where a counter member is disposed facing the principal plane of the substrate at a very small interval. SOLUTION: On an opposite surface of a shielding plate 4, a center discharge opening 12 and many peripheral edge discharge openings 19 are formed. A shielding plate holder 17 is fitted to an arm 10 through a ball push mechanism 23. Consequently, the shielding plate holder 17 and shield plate 4 are held to be displaced vertically with respect to the arm 10. Inert gas is discharged from the peripheral edge discharge openings 19, to apply a perpendicularly upward leaving-directional force to the shielding plate 4, which is displaced perpendicularly upward relatively to the arm 10. The shielding plate 4 is held at the position where the leaving-directional force and the gravitational force operating on the shielding plate 4, and the like, balance with each other. COPYRIGHT: (C)2009,JPO&INPIT
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