| 摘要 |
A semiconductor memory device has a substrate having a semiconductor layer, an n-type semiconductor region formed beneath a main surface of the semiconductor layer, a plurality of cell gates being aligned at a space from each other and including a gate insulating film formed on the main surface of the semiconductor layer, a charge storage layer formed on the gate insulating film, a charge block layer formed on the charge storage layer and a control gate electrode formed on the charge block layer, an insulating film between cells formed on the main surface of the semiconductor layer between the cell gates, and a carbon accumulation region formed in the insulating film between the cells and has a maximum concentration of a carbon element in a region within 2 nm from an interface between the semiconductor layer and the insulating film between the cells.
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