| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide: copolymers useful for forming a patterned organic film excellent in high solvent-proofenss, high water-proofness, high acid-proofness, high alkali-proofness, high heat resistance, high transparency and adhesiveness to a substrate, and obtained by developing with aqueous alkaline solution; a positive photosensitive composition containing the same; and the organic film comprising the same. <P>SOLUTION: The positive photosensitive composition contains: the copolymer of a radical polymerizable specified vinyl ketone phenol and other radical polymerizable monomer; the copolymer of a radical polymerizable monomer containing a carboxylic acid or carboxylic anhydride; and other radical polymerizable monomer, and a quinone azide compound. The organic film comprising the composition is also disclosed. <P>COPYRIGHT: (C)2009,JPO&INPIT |
