| 摘要 |
PROBLEM TO BE SOLVED: To provide a vacuum vapor-deposition apparatus in which the reproducibility of film formation is improved. SOLUTION: The vacuum vapor-deposition apparatus includes: an evaporation source which is arranged at the bottom face of a vacuum tank and has a container filled with a vapor-deposition material; a substrate-holding part arranged so as to face the container filled with the vapor-deposition material; a shutter installed in between the substrate-holding part and the container filled with the vapor-deposition material so as to be opened and closed; and further a shielding plate which is arranged at the bottom face of the vacuum tank and surrounds the container filled with the vapor-deposition material. The shielding plate has such a structure that: the height is higher than the container filled with the vapor-deposition material, but is lower than the position of the undersurface of the shutter when the shutter is closed; a region delimited by an inner circumference of the shielding plate is included in a region delimited by an outer circumference of the shutter when the shutter is closed; the shielding plate is arranged so as to be separated from the container filled with the vapor-deposition material; and the shielding plate has at least one opened part which opens a block of the region delimited by the inner circumference of the shielding plate, in a cross-sectional plan view of the shielding plate. COPYRIGHT: (C)2009,JPO&INPIT |
