发明名称 VACUUM PROCESSING APPARATUS AND VACUUM PROCESSING METHOD, AND STORAGE MEDIUM
摘要 PROBLEM TO BE SOLVED: To add an attachment module for performing processing for a substrate conveying means, making a substrate stand by, and performing processing on the substrate while suppressing an increase in the occupation area of an apparatus. SOLUTION: A recessed portion 41 is formed in the bottom portion 30 of a vacuum conveyance chamber 3, and the attachment module (cleaning module 4) for cleaning a second conveyance arm is elevated and lowered between a position where the attachment module is stored in the recessed portion 41 so as not to disturb conveyance of a wafer W by the second conveyance arm 32 and a position where the holding region of the second conveyance arm 32 is cleaned in the vacuum conveyance chamber 3. The cleaning module 4 is stored in the recessed portion 41 when not used, and projects into the vacuum conveyance chamber 3 when used, so while an increase in the occupation area of the apparatus is suppressed, the attachment module can be added. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009164213(A) 申请公布日期 2009.07.23
申请号 JP20070339987 申请日期 2007.12.28
申请人 TOKYO ELECTRON LTD 发明人 HIROKI TSUTOMU
分类号 H01L21/677;C23C14/50;C23C14/56;C23C16/44;H01L21/02;H01L21/304;H01L21/3065;H01L21/683 主分类号 H01L21/677
代理机构 代理人
主权项
地址