| 摘要 |
PROBLEM TO BE SOLVED: To provide a reaction treatment device for controlling a temperature highly accurately, when generation a prescribed reaction on a substrate. SOLUTION: This reaction treatment device for generation a prescribed reaction in a plurality of reaction domains provided on the substrate includes at least the substrate (11) on which the plurality of reaction domains are provided, a light source (12) used at least as a heat source, a scanning means (14) for scanning with light irradiated from the light source (12), and an optical element (1121) for guiding light to be used for scanning to the reaction domain. In the reaction treatment device, a diffraction angle of the optical element (1121) is adjusted so that light emitted from the optical element (1121) is irradiated to a reaction domain which is an irradiation target. COPYRIGHT: (C)2009,JPO&INPIT
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