发明名称 METHOD OF PLANARIZING SUBSTRATE, ARRAY SUBSTRATE AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME
摘要 A method of planarizing a substrate. An organic layer is formed on a base substrate to cover a metal line formed on the base substrate. A portion of the organic layer is removed to form a pre-planarization layer exposing the metal layer, so that a surface of the base substrate having the metal line is planarized. The pre-planarization layer is cured to flow toward a side surface of the metal line to form a planarization layer making contact with the side surface of the metal line. Therefore, a stepped portion between the base substrate and the metal line can be minimized or substantially eliminated, thereby increasing the surface uniformity of a subsequent layer, thereby improving the reliability of the manufacturing process.
申请公布号 US2009184325(A1) 申请公布日期 2009.07.23
申请号 US20080331044 申请日期 2008.12.09
申请人 SAMSUNG ELECTRONIC CO., LTD. 发明人 PARK JEONG-MIN;JUNG DOO-HEE;LEE HI-KUK;LEE YOUNG-WOOK
分类号 H01L33/00;B44C1/22;H01L21/336 主分类号 H01L33/00
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