发明名称 |
METHOD OF PLANARIZING SUBSTRATE, ARRAY SUBSTRATE AND METHOD OF MANUFACTURING ARRAY SUBSTRATE USING THE SAME |
摘要 |
A method of planarizing a substrate. An organic layer is formed on a base substrate to cover a metal line formed on the base substrate. A portion of the organic layer is removed to form a pre-planarization layer exposing the metal layer, so that a surface of the base substrate having the metal line is planarized. The pre-planarization layer is cured to flow toward a side surface of the metal line to form a planarization layer making contact with the side surface of the metal line. Therefore, a stepped portion between the base substrate and the metal line can be minimized or substantially eliminated, thereby increasing the surface uniformity of a subsequent layer, thereby improving the reliability of the manufacturing process.
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申请公布号 |
US2009184325(A1) |
申请公布日期 |
2009.07.23 |
申请号 |
US20080331044 |
申请日期 |
2008.12.09 |
申请人 |
SAMSUNG ELECTRONIC CO., LTD. |
发明人 |
PARK JEONG-MIN;JUNG DOO-HEE;LEE HI-KUK;LEE YOUNG-WOOK |
分类号 |
H01L33/00;B44C1/22;H01L21/336 |
主分类号 |
H01L33/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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