发明名称 IN-VACUUM PROTECTIVE LINERS
摘要 <p>This device has a liner disposed on a face in a vacuum chamber. A component in the vacuum chamber defines the face. The liner is configured to protect the workpiece from contamination or to prevent blistering of the face caused by implantation of atoms or ions into the face. The liner may be disposable and removed from the face in the vacuum chamber and replaced with a new liner in some embodiments. This liner may be a polymer with a roughened surface, be carbon-based, or be composed of carbon nanotubes in some embodiments.</p>
申请公布号 WO2009091943(A1) 申请公布日期 2009.07.23
申请号 WO2009US31192 申请日期 2009.01.16
申请人 VARIAN SEMICONDUCTOR EQUIPMENT ASSOCIATES, INC.;STONE, LYUDMILA;BLAKE, JULIAN, G.;STONE, DALE, K.;SERISKY, RON, S. 发明人 STONE, LYUDMILA;BLAKE, JULIAN, G.;STONE, DALE, K.;SERISKY, RON, S.
分类号 H01J37/30;H01L21/26 主分类号 H01J37/30
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