PLASMA PROCESSING EQUIPMENT AND GAS DISTRIBUTION APPARATUS THEREOF

摘要

A gas distribution apparatus for a plasma processing equipment is provided. The gas distribution apparatus includes a support plate (3) and a showerhead electrode (5) that are secured together parallelly to define a gas distribution chamber. A first gas distribution plate (4) is arranged in the chamber horizontally. On the upper surface of the gas distribution plate (4), at least one circumferential gas-flow groove (41) around its axis and several radial gas-flow grooves (42) connected with the circumferential gas-flow groove (41) are arranged. A plurality of axial viaholes (43) are formed in the circumferential gas-flow groove (41) and the radial gas-flow grooves (42). The gas distribution apparatus can achieve a uniform gas distribution in the plasma processing equipment.