发明名称 DEPOSITION METHOD OF ADDITIVE, AND DEPOSITION APPARATUS THEREOF
摘要 <P>PROBLEM TO BE SOLVED: To remove an additive from cleaning drain containing the additive. <P>SOLUTION: The cleaning drain 89 is stored in a tank 102. A temperature adjuster 103 adjusts the temperature of the cleaning drain 89 stored in the tank 102, keeping the temperature of the cleaning drain 89 containing the additive lower than the melting point of the additive, and keeping the cleaning drain 89 containing the additive in a supercooled state. The cleaning drain 89 sucked up from the tank 102 by a pump 102c flows down to the liquid level of the cleaning drain 89 via a shower 104. Flow down to the liquid level of the cleaning drain 89 releases the supercooled state of the additive to promote deposition of the additive into the cleaning drain 89. The deposition of the additive from the cleaning drain 89 enables easy removal of the additive from the cleaning drain 89. <P>COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009160514(A) 申请公布日期 2009.07.23
申请号 JP20080000289 申请日期 2008.01.07
申请人 FUJIFILM CORP 发明人 ISHII EIJI;HASEGAWA KOJI;MIYAKE SHIGEYUKI
分类号 B01D9/02 主分类号 B01D9/02
代理机构 代理人
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