发明名称 |
SUBSTRATE TREATMENT APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To perform a uniform and efficient treatment by a substrate treatment apparatus targeting a large-area substrate treatment using a treating liquid. <P>SOLUTION: The substrate treatment apparatus, which treats a substrate mounted on a conveying table while conveying the substrate, includes: a suction unit for sucking the treating liquid; and a blocking unit for blocking the treating liquid in this order from upstream to downstream in the conveyance direction of the substrate. Further, a cleaning unit having a brush for brushing a surface of the substrate can be disposed upstream. The cleaning unit comprises a plurality of brush units whose positions can be adjusted independently of each other. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
申请公布号 |
JP2009164346(A) |
申请公布日期 |
2009.07.23 |
申请号 |
JP20080000658 |
申请日期 |
2008.01.07 |
申请人 |
HITACHI HIGH-TECHNOLOGIES CORP |
发明人 |
YOSHIZAWA CHIE;TAKAHARA YOICHI;TANAKA TSUTOMU;MORIGUCHI YOSHIHIRO;KAMAISHI KOSEI |
分类号 |
H01L21/304;B65G49/02;B65G49/04;G02F1/13;G02F1/1333;H01L21/306 |
主分类号 |
H01L21/304 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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