摘要 |
Roughly described, a method for mask data preparation is described, for use with a preliminary mask layout that includes a starting polygon, the vertices of the starting polygon including I-points (vertices of the starting polygon having an interior angle greater than 90 degrees), including steps of developing a rectilinear partition tree on at least the I-points of the starting polygon, and using the edges of the partition tree to define the partition of the starting polygon into sub-polygons for mask writing. |
申请人 |
SYNOPSYS, INC.;SU, QING;LU, YONGQIANG;CHIANG, CHARLES, C. |
发明人 |
SU, QING;LU, YONGQIANG;CHIANG, CHARLES, C. |