| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an immersion lithography apparatus in which temperature gradient in immersion liquid and/or transportation of contaminants by the immersion liquid are reduced or prevented. <P>SOLUTION: In the immersion lithography apparatus in which immersion liquid is supplied to a localized space, a plate 24 is provided to divide a space between projection system PL and a substrate W into two parts. The plate 24 has an aperture, namely, a window allowing transmission of a projection beam PB. Such a division of the space may facilitate reduction in scattered radiation, a temperature gradient, and transportation of contaminants. <P>COPYRIGHT: (C)2009,JPO&INPIT |
