发明名称 METHOD FOR PRODUCING SILICON-CONTAINING COMPLEX OXIDE SOL, METHOD FOR PRODUCING SILICON-CONTAINING HOLOGRAM RECORDING MATERIAL, AND HOLOGRAM RECORDING MEDIUM
摘要 The present invention provides a method for producing a homogeneous complex oxide sol comprising Si and a metal other than Si as metal elements, and a method for producing a Si-containing hologram recording material using a homogeneous complex oxide sol. A method for producing a complex oxide sol comprising Si and a metal other than Si as metal elements, the method comprising: mixing a silanol compound with an alkoxide compound of a metal other than Si so that the silanol compound is reacted with the alkoxide compound, thereby yielding a precursor of a complex oxide, and adding water to the complex oxide precursor so as to hydrolyze an alkoxyl group bonded to the metal other than Si, and then making the resulting hydrolysate undergo a condensation reaction, thereby forming a complex oxide. A hologram recording medium (11) having a hologram recording layer (21) comprising the hologram recording material obtained by the production method.
申请公布号 US2009186281(A1) 申请公布日期 2009.07.23
申请号 US20090356979 申请日期 2009.01.21
申请人 TDK CORPORATION 发明人 KOSUDA ATSUKO;HAYASHIDA NAOKI;YOSHINARI JIRO;FUKUI TOSHIMI;NAKAMOTO JUNKO;YAMAKI SAORI;MENDOZA HEIDY HODEX VISBAL
分类号 G03F7/00 主分类号 G03F7/00
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