| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a batch forming system for an amorphous silicon thin film, which can improve a production speed. <P>SOLUTION: A p-layer formation chamber 11 has a sealing gate 12 by stacking one layer of amorphous silicon p-type thin film on a piece-like stacking object 99. An i-layer formation chamber 13 has a sealing gate 14 by stacking one layer of amorphous silicon i-type thin film on a piece-like stacking object 99. An n-layer formation chamber 15 has a sealing gate 16 by stacking one layer of amorphous silicon n-type thin film on a piece-like stacking object 99. A shared vacuum chamber 17 communicates with the p-layer formation chamber 11, the i-layer formation chambers 13 and the n-layer formation chamber 15. A transport device 21 is arranged to be movable in the shard vacuum chamber 17, and has a reception surface 22. A transport vehicle 25 is positioned on the reception surface 22, and transports the plurality of piece-like stacking objects 99. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
