发明名称 |
ATMOSPHERIC PRESSURE PLASMA, GENERATING METHOD, PLASMA PROCESSING METHOD AND COMPONENT MOUNTING METHOD USING SAME, AND DEVICE USING THESE METHODS |
摘要 |
A first inert gas (5) is supplied into a reaction space (1) and a high-frequency power supply (4) applies a high-frequency electric field so that a primary plasma (6) composed of the first inert gas which has been made into the plasma is ejected from the reaction space. A mixed gas area (10) in which a mixed gas (8) having a second inert gas (12) as a main ingredient and a proper amount of a reactive gas (13) mixed is formed. The primary plasma collides into the mixed gas area to generate a secondary plasma (11) composed of the mixed gas which has been made into the plasma, and the secondary plasma is sprayed on a processed object (S) to carry out a plasma processing. Accordingly, the plasma processing is carried out in a wide range by an atmospheric pressure plasma generated by a small input power.
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申请公布号 |
US2009186167(A1) |
申请公布日期 |
2009.07.23 |
申请号 |
US20070299174 |
申请日期 |
2007.05.28 |
申请人 |
PANASONIC CORPORATION |
发明人 |
TSUJI HIROYUKI;INOUE KAZUHIRO |
分类号 |
H05H1/24 |
主分类号 |
H05H1/24 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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