| 摘要 |
<P>PROBLEM TO BE SOLVED: To restrain a line width generated in a splice part of each transfer pattern spliced on a photosensitive substrate. <P>SOLUTION: This exposure device EX for transferring a projection image of an object M onto the photosensitive substrate P, using a plurality of projection optical modules PLa-PLg, is provided with a regulation mechanism 14 for changing a transfer characteristic of the projection image with respect to the photosensitive substrate, a storage means 80 for storing transfer characteristic information indicating the transfer characteristic in each of the projection optical modules, a splice information acquiring means for acquiring splice position information corresponding to a splice position between the first projection image and the second projection image spliced on the photosensitive substrate, out of the projection image of the object, and a control means CONT for calculating a regulation value of the regulation mechanism corresponding to a characteristic difference of the transfer characteristic between the first projection image and the second projection image in the splice position, based on the transfer characteristic information and the splice position information, and for operating the regulation mechanism, based on the regulation value, to change the transfer characteristic in at least one of the first projection image and the second projection image. <P>COPYRIGHT: (C)2009,JPO&INPIT |
