发明名称 METHOD FOR TREATING FINE STRUCTURE, SYSTEM FOR TREATING FINE STRUCTURE, AND METHOD FOR PRODUCING ELECTRONIC DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a method for treating a fine structure that can suppress deformation or breakage of protrusions formed on a surface of the fine structure under an influence of the surface tension of a liquid remaining between protrusions, and to provide a system for treating the fine structure, and ro provide a method for producing an electronic device. SOLUTION: The method for treating the fine structure includes supplying a liquid, having a smaller surface tension than that of water and does not substantially have compatibility with water to the surface of the fine structure having protrusions on the surface thereof, and treats the surface of the fine structure. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009164214(A) 申请公布日期 2009.07.23
申请号 JP20070339999 申请日期 2007.12.28
申请人 TOSHIBA CORP 发明人 HAYAMIZU NAOYA;FUJITA HIROSHI
分类号 H01L21/304 主分类号 H01L21/304
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