MANUFACTURING METHOD OF ARRAY SUBSTRATE FOR LIQUID CRYSTAL DISPLAY

摘要

A method for manufacturing an array substrate for a liquid crystal display device is provided to perform the batch etching for a molybdenum-based metal/aluminum-based metal double film and an indium oxide film. A molybdenum-based/aluminum-based metal double film is formed on a substrate and is etched by the etching solution composition. A gate line is formed. A gate insulating layer is formed on a substrate including the gate line. A semiconductor layer is formed on the gate insulating layer. Source and drain electrodes are formed on the semiconductor layer. The indium oxide film is formed and etched by the etching solution composition.