发明名称 |
Method for measuring the active koh concentration in a koh etching process |
摘要 |
<p>The invention relates to a method for in-line measuring the active KOH concentration in a KOH etching process in which process silicon hydroxide is produced by a reduction reaction according to the formula: 2K+ (aq.)+2OH- (aq.)+2H2O+Si->2K+ (aq.)+H2SiO42- (aq.)+2H2 (g). The total concentration of KOH bath is measured by using a refractometer and the measurement result is corrected by the estimated K2H2SiO4 concentration.</p> |
申请公布号 |
EP2079857(A1) |
申请公布日期 |
2009.07.22 |
申请号 |
EP20060807993 |
申请日期 |
2006.10.11 |
申请人 |
JANESKO OY |
发明人 |
VOIPIO, VILLE |
分类号 |
C23F1/40;G01N21/41;H01L21/306;H01L21/66 |
主分类号 |
C23F1/40 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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