| 摘要 |
<p>A process for the preparation of a sputtering target which comprises sub- stoichiometric titanium dioxide, TiO x, where x is below 2 having an electrical resistivity of less than 0.5 ohm.cm, optionally togethe r with niobium oxide, which process comprises plasma spraying titanium dioxide, TiO2, optionally together with niobium oxide, onto a targe t base in an atmosphere which is oxygen deficient and which does not contain oxygen-containing compounds, the target base being coated with TiO x which is solidified by cooling under conditions which prevent the sub-stoichiometric titanium dioxide from combining with oxygen.</p> |
