发明名称 Transparent conductive film and transparent conductive base material utilizing the same
摘要 The transparent conductive film 1 includes laminated transparent conductive thin films 10 and 20 of at least two layers. The transparent conductive thin film of the uppermost layer is an amorphous oxide thin film composed of gallium, indium, and oxygen, a gallium content ranges from 49.1 atom % to 65 atom % with respect to all metallic atoms, a work function is 5.1 eV or more, and a surface resistance is 100 Omega/□ or less. The transparent conductive base material includes a transparent substrate and the transparent conductive film 1 formed one or both surfaces of the transparent substrate.
申请公布号 US7563514(B2) 申请公布日期 2009.07.21
申请号 US20040575471 申请日期 2004.12.28
申请人 SUMITOMO METAL MINING CO., LTD. 发明人 NAKAYAMA TOKUYUKI;ABE YOSHIYUKI
分类号 B32B9/00;C03C17/245;C03C17/34;C23C14/08;C23C14/34;G02F1/1333;G02F1/1343;H01B1/08;H01B5/14;H05B33/28 主分类号 B32B9/00
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