Process for the manufacturing of a sputter target

摘要

The invention relates to a process for manufacturing a sputter target. The process comprises the steps of-providing a target holder (12); -applying an intermediate layer (14) on said target holder; -applying a top layer (16) on top of said intermediate layer; said top layer comprising a material having a melting point which is substantially higher than the melting point of said target material; -heating the target holder coated with said intermediate layer and said top layer.