TREATMENT METHOD FOR SURFACE OF SUBSTRATE, METHOD OF FABRICATING IMAGE SENSOR BY USING THE TREATMENT METHOD AND IMAGE SENSOR FABRICATED BY THE SAME

摘要

A processing method of a substrate surface, an image sensor manufacturing method using the same, and an image sensor manufactured thereby are provided to improve a low illumination characteristic of an image sensor by removing defects of a surface of a substrate. A silicon substrate preparation process is performed to prepare a silicon substrate having a surface defect(S510). A chemical solution supply process is performed to supply a chemical solution for processing a surface of the silicon substrate(S520). A chemical oxide layer manufacturing process is performed to consume the surface of the silicon substrate and to manufacture a chemical oxide layer on the silicon substrate(S530). A surface defect removal process is performed to remove defects from the surface of the silicon substrate.