STRIPPER COMPOSITION FOR REMOVAL PHOTORESIST RESIDUE AND STRIPPING METHOD OF PHOTORESISTS USING THE SAME

摘要

A stripper solution composition for removing a photoresist residue, and a stripping method using the composition are provided to reduce the washing time owing to the easy washing by deionized water. A stripper solution composition for removing a photoresist residue comprises 0.1 ~ 20 weight% of an organic sulfonic acid compound; 0.1 ~ 20 weight% of an aromatic hydroxycarboxylic acid compound represented by the formula 1; and the balance of water, wherein m is an integer of 1 ~ 3; and n is an integer of 1 ~ 3..