发明名称 |
Method and apparatus for lens contamination control |
摘要 |
The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an alignment offset of the asymmetric pattern associated with the lens system. A contamination of the lens system is determined by comparing the alignment offset to a reference value.
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申请公布号 |
US7564556(B2) |
申请公布日期 |
2009.07.21 |
申请号 |
US20070695166 |
申请日期 |
2007.04.02 |
申请人 |
TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY |
发明人 |
CHANG KEH-WEN;CHEN JUN-REN |
分类号 |
G01B11/00;G01B9/00;G01N21/00;G03B27/32;G03F9/00 |
主分类号 |
G01B11/00 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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