| 发明名称 |
POLISHING PAD |
| 摘要 |
A polishing pad which does not easily generate scratches on the surface of a subject to be polished and has excellent planarizing performance. The polishing pad is provided with a polishing layer composed of a polyurethane resin foam having fine bubbles, and the polyurethane resin foam has a tensile breaking elongation of 25-120%.
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| 申请公布号 |
KR20090078845(A) |
申请公布日期 |
2009.07.20 |
| 申请号 |
KR20097013449 |
申请日期 |
2006.05.10 |
| 申请人 |
TOYO TIRE & RUBBER CO., LTD. |
发明人 |
KAZUNO ATSUSHI;OGAWA KAZUYUKI;NAKAMORI MASAHIKO;YAMADA TAKATOSHI;SHIMOMURA TETSUO |
| 分类号 |
B24B37/24;B24D11/00;C08G18/10;H01L21/304 |
主分类号 |
B24B37/24 |
| 代理机构 |
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代理人 |
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