发明名称 REVERSE PULSE RECTIFICATION TYPE POWER SUPPLY FOR PLATING AND CURRENT CONTROL METHOD THEREOF
摘要 A reverse pulse rectification type power supply for plating and a current control method thereof are provided to minimize power loss by supplying a current to a target to be plated as a pulse type. A power supply unit for plating comprises a rectifier(10), a main electric current circuit(20), and a pulse controller(40). The rectifier converts AC power into DC power source, and the main current circuit converts power from the rectifier into pulse power and applies it to a load(30). The main electric current circuit outputs a forward current and a reverse current by the pulse controller alternately. The pulse controller modulates a high speed pulse in the forward current and the reverse current by a PWM control.
申请公布号 KR20090054888(A) 申请公布日期 2009.06.01
申请号 KR20080053121 申请日期 2008.06.05
申请人 UPI CO., LTD. 发明人 RA, BYUNG CHUL
分类号 H02M7/04 主分类号 H02M7/04
代理机构 代理人
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