| 摘要 |
<p>The invention is within the field of lithography microscopes for illumination of semiconductor wafers that are covered with resist. An apparatus uses degassing of an immersion liquid, for this, possible means include a heater for degasification, degassing by reduced pressure, degassing by membranes that can be liquid repellent, and where the specific degassing with respect to nitrogen or oxygen is mentioned.</p> |
