| 摘要 |
PROBLEM TO BE SOLVED: To provide an interferometer device for measuring a large-sized sample acquiring in a short period of time a plurality of interference fringe images corresponding to portions in a domain to be measured necessary for aperture synthesis, respectively, and measuring highly accurately thickness irregularities over the whole area of the domain to be measured of a specimen, concerning the large-sized sheet-shaped specimen. SOLUTION: The first interferometer heads 1A-1G for irradiating measuring light from one surface 9a side of the specimen 9, and acquiring the first interference fringe image carrying transmission wavefront information of each first domain on the specimen 9, and the second interferometer heads 2A-2F for irradiating measuring light from the other surface side 9b of the specimen 9, and acquiring the second interference fringe image carrying transmission wavefront information of each second domain on the specimen 9, are arranged so that the first domain and the second domain which are mutually adjacent are overlapped partially, and that the domain to be measured is included wholly by respective first domains and second domains. COPYRIGHT: (C)2009,JPO&INPIT
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