| 摘要 |
PROBLEM TO BE SOLVED: To provide a film deposition system for a substrate where ultraviolet rays can be emitted from an ultraviolet emission lamp from a position close to each substrate, the substrate can be efficiently and uniformly cleaned, and the ultraviolet emission lamp does not interfere with a passage from a vapor deposition source to the substrate. SOLUTION: Inside of a chamber 1 constituting a vacuum deposition system, a dome 4 mounted with a prescribed number of substrates 10 to be film-deposited is disposed, and a vapor deposition source unit 5 is installed in the lower position of the dome 4. The lamp unit 22 constituted of an ultraviolet emission lamp 20 and a lamp house 21 can be displaced in a reciprocative manner between an ultraviolet emission position approaching the dome 4 and a retreating position separated from the dome 4. The ultraviolet emission lamp 20 has a line shape, its length dimensions are longer than the arrangement width dimensions of each substrate mounting hole 7 to be mounted with each substrate 10, and it faces each substrate 10 with a slight gap at the ultraviolet emission position. COPYRIGHT: (C)2009,JPO&INPIT
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