SUSCEPTOR FOR CHEMICAL VAPOR DEPOSITION APPARATUS

摘要

A susceptor for a chemical vapor deposition device is provided to manufacture a high quality substrate by improving a bowing effect of a substrate in a substrate growing process. A plurality of pockets(130) is formed on a top surface of a rotation body(110). A substrate(2) is arranged on the pocket. The pockets are formed into a columnar direction based on a rotation center of the rotation body. A coupling part coupled with a rotation shaft(38) of a driving motor is formed on a bottom surface of the rotation body. The pocket includes a concave part(131). The concave part having a diameter smaller than the substrate is formed on a center part of the pocket. A loading part(132) is arranged on an outer circumference of the concave part. A trap(120) is caved into a fixed depth.