| 摘要 |
A high-voltage device including a first conductive type substrate, a gate, a second conductive type well, a second conductive type source region, a second conductive type drain region, conductive layers, and a first conductive type top layer. The gate is disposed on the substrate, and the well is disposed in the substrate at one side of the gate. The source region is disposed in the substrate at the other side of the gate. The drain region is disposed in the well of the substrate. The conductive layers are disposed on the substrate between the gate and the drain region. The top layer is disposed in the well of the substrate, and the well is below the conductive layers. One portion of the top layer near the gate has a thickness greater than that of the other portion of the top layer away from the gate.
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