HIGH-RESOLUTION FLEXURAL STAGE FOR IN-PLANE POSITION AND OUT-OF-PLANE PITCH/ROLL ALIGNMENT
摘要
An adjustment structure used in conjunction with an imprinting structure is provided. The adjustment structure includes a sample mount for mounting a sample. An actuator mechanism is coupled to the sample mount, the actuator mechanism producing actuated forces on a X-Y plane to produce movements on a sample mount. A plurality of bladed flexures are positioned on the sample mount. The bladed flexures controls the movements of the sample mount produced by the actuator mechanism so as to allow adjustments in angular alignment about the pitch-roll (TX-TY) rotation axes or the X-Y plane relative to the sample mount so the imprinting structure can perform its operations on the sample.
申请公布号
WO2008151107(A3)
申请公布日期
2009.04.16
申请号
WO2008US65484
申请日期
2008.06.02
申请人
MASSACHUSETTS INSTITUTE OF TECHNOLOGY;SHILPIEKANDULA, VIJAY;YOUCEF-TOUMI, KAMAL