| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a stencil mask which is suitable for manufacture of the stencil mask including a fine throughhole pattern. <P>SOLUTION: A hard mask layer is patterned through self-organization of a block copolymer, by which a micropattern is formed in the hard mask layer, and at the same time the hard mask layer can be formed as a mask having a high etching selection ratio to a thin-film layer. With such constitution, the mask for forming the throughhole pattern in the thin-film layer can be formed with the fine pattern, and the stencil mask having the fine throughhole pattern can be manufactured. <P>COPYRIGHT: (C)2009,JPO&INPIT</p> |
