| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a new photoacid generator suitable as a photoacid generator for a resist material, a resist material using it, and a pattern forming method. <P>SOLUTION: The photoacid generator is used for chemically amplified resist material that is responsive to a high energy line of ultraviolet, extravital ultraviolet, electronic beam, EUV, X-ray, excimer laser, γ-ray, or synchrotoron radiation, and generates sulfonic acids represented by the general expression (1a): R<SP>1</SP>-COOCH(CF<SB>3</SB>)CF<SB>2</SB>SO<SB>3</SB><SP>-</SP>H<SP>+</SP>or the general expression (1c): (1a) R<SP>1</SP>-O-COOCH(CF<SB>3</SB>)CF<SB>2</SB>SO<SB>3</SB><SP>-</SP>H<SP>+</SP>, where R<SP>1</SP>represents a carbon number of 20-50 hydrocarbon group having a steroid structure. The photoacid generator is excellently compatible with resins in the resist material and can perform acid diffusion control. The photoacid generator that generates sulfonic acids can be used in the processes of application, baking before exposure, exposure, baking after exposure and development in a device manufacturing process without any problem. <P>COPYRIGHT: (C)2009,JPO&INPIT |
