发明名称 METHOD, SYSTEM, AND APPARATUS FOR GATING CONFIGURATIONS AND IMPROVED CONTACTS IN NANOWIRE-BASED ELECTRONIC DEVICES
摘要 Methods, systems, and apparatuses for electronic devices having improved gate structures are described. An electronic device includes at least one snowier; a gate contact is positioned along part of the length of the snowier, and a dielectric material layer is between the gate contact and the at least one snowier. At least a portion of the source contact and/or the drain contact overlaps with the gate contact along the snowier length. In another aspect, an electronic device includes a snowier having a semiconductor core surrounded by an insulating shell layer. A ring shaped first gate region surrounds the snowier along a portion of the length of the snowier. A second gate region is positioned along the length of the snowier between the snowier and the substrate. A source contact and a drain contact are coupled to the semiconductor core of the snowier at respective exposed portions of the semiconductor core.
申请公布号 WO2007030126(A3) 申请公布日期 2009.04.16
申请号 WO2005US37237 申请日期 2005.10.14
申请人 NANOSYS, INC.;MOSTARSHED, SHAHRIAR;CHEN, JIAN;LEON, FRANCISCO;PAN, YAOLING;ROMANO, LINDA T. 发明人 MOSTARSHED, SHAHRIAR;CHEN, JIAN;LEON, FRANCISCO;PAN, YAOLING;ROMANO, LINDA T.
分类号 H01L29/775 主分类号 H01L29/775
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