METHOD AND SYSTEM FOR NON-DESTRUCTIVE DISTRIBUTION PROFILING OF AN ELEMENT IN A FILM
摘要
<p>A method to determine a distribution profile of an element in a film. The method comprises exciting an electron energy of an element deposited in a first film, obtaining a first spectrum associating with the electron energy, and removing a background spectrum from the first spectrum. Removing the background value generates a processed spectrum. The method further includes matching the processed spectrum to a simulated spectrum with a known simulated distribution profile for the element in a film comparable to the first film. A distribution profile is obtained for the element in the first film based on the matching of the processed spectrum to a simulated spectrum selected from the set of simulated spectra.</p>
申请公布号
WO2007008374(A3)
申请公布日期
2009.04.16
申请号
WO2006US24581
申请日期
2006.06.23
申请人
REVERA INCORPORATED;DECECCO, PAOLA;SCHUELER, BRUNO;REED, DAVID;KWAN, MICHAEL;BALLANCE, DAVID, S.
发明人
DECECCO, PAOLA;SCHUELER, BRUNO;REED, DAVID;KWAN, MICHAEL;BALLANCE, DAVID, S.