发明名称 CHARACTERISTIC CONTROL METHOD FOR N-TYPE OXIDE SEMICONDUCTOR
摘要 PROBLEM TO BE SOLVED: To provide a novel use of an n-type oxide semiconductor represented by titanium oxide by making good use of characteristics unique thereto. SOLUTION: Disclosed is a characteristic control method for the n-type oxide semiconductor characterized in that the coating or molding of the n-type oxide semiconductor is irradiated with femtosecond laser light; and a characteristic control method for n-type oxide semiconductor characterized in that after the n-type oxide semiconductor is irradiated with femtosecond laser light by the method, the irradiating portion is irradiated with continuous wave laser light or pulse laser light of≤1 ms in pulse interval to be put into the state before the irradiation with the femtosecond laser light. COPYRIGHT: (C)2009,JPO&INPIT
申请公布号 JP2009081235(A) 申请公布日期 2009.04.16
申请号 JP20070248660 申请日期 2007.09.26
申请人 OSAKA UNIV;OKUNO CHEM IND CO LTD;UNIV KINKI;LASER GIJUTSU SOGO KENKYUSHO;OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE 发明人 TSUKAMOTO MASAHIRO;ABE NOBUYUKI;TAKAHASHI MASAYA;OTSUKA KUNIAKI;YOSHIDA MINORU;NAKANO HITOSHI;FUJITA MASAYUKI
分类号 H01L21/428;H01L21/268 主分类号 H01L21/428
代理机构 代理人
主权项
地址