发明名称 |
CHARACTERISTIC CONTROL METHOD FOR N-TYPE OXIDE SEMICONDUCTOR |
摘要 |
PROBLEM TO BE SOLVED: To provide a novel use of an n-type oxide semiconductor represented by titanium oxide by making good use of characteristics unique thereto. SOLUTION: Disclosed is a characteristic control method for the n-type oxide semiconductor characterized in that the coating or molding of the n-type oxide semiconductor is irradiated with femtosecond laser light; and a characteristic control method for n-type oxide semiconductor characterized in that after the n-type oxide semiconductor is irradiated with femtosecond laser light by the method, the irradiating portion is irradiated with continuous wave laser light or pulse laser light of≤1 ms in pulse interval to be put into the state before the irradiation with the femtosecond laser light. COPYRIGHT: (C)2009,JPO&INPIT |
申请公布号 |
JP2009081235(A) |
申请公布日期 |
2009.04.16 |
申请号 |
JP20070248660 |
申请日期 |
2007.09.26 |
申请人 |
OSAKA UNIV;OKUNO CHEM IND CO LTD;UNIV KINKI;LASER GIJUTSU SOGO KENKYUSHO;OSAKA MUNICIPAL TECHNICAL RESEARCH INSTITUTE |
发明人 |
TSUKAMOTO MASAHIRO;ABE NOBUYUKI;TAKAHASHI MASAYA;OTSUKA KUNIAKI;YOSHIDA MINORU;NAKANO HITOSHI;FUJITA MASAYUKI |
分类号 |
H01L21/428;H01L21/268 |
主分类号 |
H01L21/428 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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